Official Course Description: MCCCD Approval: 07/22/08 | |||
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ELE286 20026-20086 | L+L | 4 Credit(s) | 6 Period(s) |
Introduction to Monolithic Integrated Circuit Devices and Radio Frequency (RF) Plasma Technologies | |||
Physics and electronics of bipolar and MOS devices used in integrated
circuits. Overview of radio frequency (RF) plasma technologies. Laboratory
experience in integrated circuit fabrication.
Prerequisites: AMS160. | |||
Cross-References: SMT286 | |||
MCCCD Official Course Competencies: | |
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ELE286 20026-20086 | Introduction to Monolithic Integrated Circuit Devices and Radio Frequency (RF) Plasma Technologies |
1. | Explain historical and current contexts for the principles and applications of integrated circuits. (I) |
2. | Work effectively in collaborative groups. (I, II, III) |
3. | Demonstrate appropriate semiconductor fabrication environment behavior in terms of safety, particle and defect reduction, and wafer handling. (I, II, III) |
4. | Fabricate functional integrated circuits. (II) |
5. | Measure oxide thickness, critical dimensions, and electrical characteristics of integrated circuits. (III) |
6. | Describe the major functional blocks of a plasma system. (IV) |
MCCCD Official Course Outline: | |
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ELE286 20026-20086 | Introduction to Monolithic Integrated Circuit Devices and Radio Frequency (RF) Plasma Technologies |
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